Residual stress field of HIPed silicon nitride rolling elements

Ceramics International

Volumn 28, Issue 6, 2002, Pages 645-650

  Kang, J ^a   Hadfield, M ^a   Tobe, S ^b  

^a BOURNEMOUTH UNIVERSITY   (United Kingdom)

^b ASHIKAGA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

A. Finishing; B. X ray method; C. Fatigue; D. Si3N4; Residual stress

Indexed keywords

COMPRESSIVE STRESS; FATIGUE OF MATERIALS; HOT ISOSTATIC PRESSING; LOADS (FORCES); RESIDUAL STRESSES; ROLLING; SURFACE TREATMENT; X RAY ANALYSIS;

RESIDUAL COMPRESSIVE STRESSES;

SILICON NITRIDE;

EID: 0036066689     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0272-8842(02)00021-4     Document Type: Article

References (16)

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5. The effect of accelerated material removal on roundness and residual stresses in ceramic balls
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15. 4 with different surface roughness