Drive current enhancement by ideal junction profile using laser thermal process

IEEE Symposium on VLSI Circuits, Digest of Technical Papers

Volumn , Issue , 2002, Pages 138-139

  Yamamoto, T ^a   Goto, K ^a   Tada, Y ^a   Kikuchi, Y ^a   Kubo, T ^a   Wang, Y ^a   Talwar, S ^a   Kase, M ^a   Sugii, T ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ION IMPLANTATION; LASER BEAM EFFECTS; OPTIMIZATION; THERMOANALYSIS;

LASER THERMAL PROCESS (LTP);

MOSFET DEVICES;

EID: 0036053274     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)