Maleimide based tetrapolymers for use in lift-off resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 I, Issue , 2002, Pages 262-269

  Chen, Cindy X ^a   Hurditch, Rodney J ^a   Johnson, Donald W ^a   Nawrocki, Daniel J ^a  

^a MicroChem Corp   (United States)

Author keywords

Lift off resists; Maleimide copolymers; PMGI

Indexed keywords

ANTIREFLECTION COATINGS; COPOLYMERIZATION; DISSOLUTION; FABRICATION; FREE RADICAL POLYMERIZATION; RESINS; SOLUBILITY; TERPOLYMERS; THIN FILMS;

LIFT-OFF RESISTS;

PHOTORESISTS;

EID: 0036030587     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474224     Document Type: Conference Paper

References (2)

1. J.C. Guibert, M. Chevalier, "An improved bilayer PMGI lithographic process", Microelectronic Engineering, 1987; pp 487-494.
2. R.M. Kopchik, United State Patent #4246374, 1981.