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Volumn 4717, Issue , 2002, Pages 120-135

Process-based real-time scene data processor design for emitter array infrared projectors

Author keywords

Dynamic infrared scene projection; Nonuniformity correction; Real time processing

Indexed keywords

COMPUTER SIMULATION; DIGITAL TO ANALOG CONVERSION; ELECTRIC POTENTIAL; INFRARED RADIATION;

EID: 0036029716     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.474713     Document Type: Article
Times cited : (6)

References (12)
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  • 2
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  • 3
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    • A simplified method for the hardware implementation of nonuniformity correction on a resistor array infrared scene projector
    • Technologies for Synthetic Environments: Hardware-in-the-loop Testing II
    • L.E. Jones, E.M. Olson, R.L. Murrer Jr. and A.R. Andrews, "A simplified method for the hardware implementation of nonuniformity correction on a resistor array infrared scene projector," in Technologies for Synthetic Environments: Hardware-in-the-loop Testing II, Proc. SPIE Vol. 3084, 139-150 (1997).
    • (1997) Proc. SPIE , vol.3084 , pp. 139-150
    • Jones, L.E.1    Olson, E.M.2    Murrer, R.L.3    Andrews, A.R.4
  • 4
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    • Optimization of resistor array infrared projector temporal response
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    • E.M. Olson, O.M. Williams and R.A. Thompson, "Optimization of resistor array infrared projector temporal response," in Technologies for Synthetic Environments: Hardware-in-the-loop Testing VI, Proc. SPIE Vol. 4366, 475-488 (2001).
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    • Olson, E.M.1    Williams, O.M.2    Thompson, R.A.3
  • 5
    • 0005008177 scopus 로고    scopus 로고
    • Refinements in practical accuracy factors for resistor array IR scene projectors
    • Technologies for Synthetic Environments: Hardware-in-the-loop Testing III
    • A.P. Pritchard, M.A. Venables, S.P. Lake and D.W. Gough, "Refinements in practical accuracy factors for resistor array IR scene projectors," in Technologies for Synthetic Environments: Hardware-in-the-loop Testing III, Proc. SPIE Vol. 3368, 237-244 (1998).
    • (1998) Proc. SPIE , vol.3368 , pp. 237-244
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  • 6
    • 0033365907 scopus 로고    scopus 로고
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    • E.M. Olson and R.L. Murrer Jr., "Non-uniformity correction of a resistor array infrared scene projector," in Technologies for Synthetic Environments: Hardware-in-the-loop Testing IV, Proc. SPIE Vol. 3697, 403-413 (1999).
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  • 7
    • 0029229308 scopus 로고
    • Optimization of measurement process variables used in radiance uniformity calibration of the emitter source for the Wide Band Infrared scene Projector (WISP)
    • Targets and Backgrounds: Characterization and Representation
    • C. Malone and D. Flynn, "Optimization of measurement process variables used in radiance uniformity calibration of the emitter source for the Wide Band Infrared scene Projector (WISP)," in Targets and Backgrounds: Characterization and Representation, Proc. SPIE Vol. 2469, 118-131 (1995).
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  • 8
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    • B. Cole, R. Higashi, J. Ridley, J. Holmen, R. Stockbridge, L. Murrer and E. Burroughs, "Large-area infrared microemitter arrays for dynamic infrared scene projection," in Technologies for Synthetic Environments: Hardware-in-the-loop Testing III, Proc. SPIE Vol. 3368, 57-70 (1998).
    • (1998) Proc. SPIE , vol.3368 , pp. 57-70
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  • 9
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  • 10
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.