Verifying RET mask layouts

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4692, Issue , 2002, Pages 336-344

  Mayhew, Jeff ^a   Rieger, Mike ^a   Li, Jiangwei ^a   Zhang, Lin ^a   Tang, Zongwu ^a   Shiely, Jim ^a  

^a Avant Corporation   (United States)

Author keywords

Lithography rule checking; Mask synthesis; Mask verification; OPC; Optical proximity correction; RET; Reticle enhancement techniques

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; COMPUTER SIMULATION; LOGIC GATES; MASKS; PHOTOLITHOGRAPHY; SILICON WAFERS;

OPTICAL PROXIMITY CORRECTION (OPC);

INTEGRATED CIRCUIT LAYOUT;

EID: 0036028759     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.475670     Document Type: Article

References (9)

1. Michael L. Rieger, and John P. Stirniman, "Proximity Correction System for Wafer Lithography", U.S. Patent 6,081,658, issued June 27, 2000.
2. Our model-based OPC tool was formerly known as Taurus-OPC; it has now reverted to its original name, Proteus.
3. John P. Stirniman, and Michael L. Rieger, "Spatial filter models to describe IC lithographic behavior", in Optical Microlithography X, Proc. SPIE Vol. 3051, pp. 469-479, 1997.
4. Michael L. Rieger and John P. Stirniman, "TCAD Physical Verification for Reticle Enhancement Techniques", Solid State Technology, July 2000.
5. Explorer is a graphical user interface that makes it possible to navigate, visualize, and manage large amounts of information encoded in verification errors and warnings produced by Hercules/Venus physical verification jobs.
6. United States Patent Numbers 5,242,770 and 5,447,810 claim certain aspects of the use of Auxiliary Features to address proximity effects and depth of focus issues. The patents were assigned to MicroUnity Systems Engineering, Inc. and, as with all patents, are presumed valid pursuant to 35 U.S.C. §282.
7. Vinod K. Malhotra, and Fang-Cheng Chang, "Verifying the 'Correctness' of Your Optical Proximity Correction Designs", in Optical Microlithography XII, Proc. SPIE Vol. 3679, pp. 130-137, 1999.
8. F.M. Schellenberg, Olivier Toublan, Luigi Capodieci, and Bob Socha, "Adoption of OPC and the Impact on Design and Layout", Design Automation Conference Proceedings, pp. 89-92, 2001.
9. Michael L. Rieger, Jeffrey P. Mayhew, Jiangwei Li, and James P. Shiely, "OPC Strategies to Minimize Mask Cost and Writing Time", BACUS 2001.