Improving the detection limits for vapor phase decomposition-inductively coupled plasma mass spectrometry (VPD-ICP-MS) analysis

Journal of Analytical Atomic Spectrometry

Volumn 17, Issue 9, 2002, Pages 1194-1201

  Ferrero, Evelyn Jones ^a   Posey, Dan ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INDUCTIVELY COUPLED PLASMA; SILICON WAFERS; TRACE ELEMENTS; X RAY SPECTROMETERS;

VAPOR PHASE DECOMPOSITION (VPD);

MASS SPECTROMETRY;

EID: 0036025868     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b201759h     Document Type: Conference Paper

References (14)

1. International Technology Roadmap for Semiconductors: 1999 Edition, http://public.itrs.net/Files/1999_SIA_Roadmap/Home.htm, accessed January 21, 2002.
2. H. J. Rath and R. Neunteufel, Proceedings of the Satellite Symposium to Essderc 89 Berlin, ed. Bernd O. Kolbesen, The Electrochemical Society, 1990, 90-11, pp. 335-340.
3. L. H. Hall, J. A. Sees and B. L. Schmidt, SIA Surf. Interface Anal., 1996, 24, 511-516.
4. M. R. Frost, W. L. Harrington, D. F. Downey and S. R. Walther, J. Vac. Sci. Technol. B 14(1), 1996, 329-335.
5. S. Metz, G. Kilian, G. Mainka, C. Angelkort, A. Fester, B. O. Kolbesen, Electrochemical Proceedings, The Electrochemical Society, 1997, 97-22, pp. 458-467.
6. P. Gupta, Z. Pourmotamed, S. H. Tan and R. McDonald, International Workshop on Semiconductor Characterization, ed. W. M. Bullis, D. G. Seiler and A. C. Diebold, AIP Press, Woodbury, N.Y., 1996, pp. 450-455.
7. P. Gupta, S. H. Tan, Z. Pourmotamed, F. Cristobal, N. Oshiro and B. McDonald, Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing III, ed. D. N. Schmidt, D. R. Reedy, J. V. Martinez de Pinillos and R. Guddi, The Electrochemical Society, 1994, 94-9, pp. 200-221.
8. M. K. Balazs and J. Fucsko, Presented at International Semiconductor Characterization Workshop-NIST Poster Session, January 30-February 2, 1995.
9. A. Krushevska, S. Tan, M. Passer and X. Rong Liu, J. Anal. At. Spectrom., 2000, 15, 1211-1216.
10. C. Neumann and P. Eichinger, Spectrochim. Acta, 1991, 46B(10), 1369.
11. S. D. Tanner, V. I. Baranov and U. Vollkopf, J. Anal. At. Spectrom., 2000, 15(9), 1216-1269.
12. R. Thomas, Spectroscopy, 2001, 16(10), 47-48.
13. ELEMENT-Application Flash Report No. E3, PL 01/1236, Finnigan MAT GmdH, Bremen, Germany, 1997.
14. S. DeGendt, A. Huber, B. Onsia, S. Arnauts, K. Kenis, D. M. Knotter, P. W. Mertens and M. M. Heyns, Solid State Phenomena, 1999, 65-66, 93-96.