Formation and thermal stability of Ti-capped Co-silicide from Co-Ta alloy films on (100) Si and polycrystalline silicon

Journal of the Korean Physical Society

Volumn 40, Issue 4, 2002, Pages 737-741

  Kim, Min Joo ^a   Choi, Hyo Jick ^a   Ko, Dae Hong ^a   Ku, Ja Hum ^b   Choi, Siyoung ^b   Fujihara, Kazuyuki ^b   Yang, Cheol Woong ^c  

^a Yonsei University   (South Korea)

^b SAMSUNG Electronics   (South Korea)

^c Sungkyunkwan University   (South Korea)

Author keywords

Co silicide; Co Ta alloy; Thermal stability

Indexed keywords

EID: 0036011370     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.40.737     Document Type: Conference Paper

References (21)

1. J. Lin, W. Chen, S. Banerjee, J. Lee and C. Magee, J. Electron Mater. 22, 6 (1993).
2. Q.F. Wang, K. Maex, S. Kubicek, R. Jonekheere, B. Kerkwijk and R. Verbeeck, Sypm. VLSI Tech. Dig, Tech. Papers (Kyoto, Japan, 1995), p. 17.
3. Jinhwa Heo and Hyeongtag Jeo, J. Korean Phys. Soc. 37, 1057 (2000).
4. S.P. Murarka, Silicide for VLSI Application (Academic Press, New York, 1983).
5. K. Maex, Materials Science and Engineering Reports R11, 53 (1993).
6. T.B. Massalski, Binary Alloy Phase Diagrams (American Society for Metals, 1986), Vol. 2, p. 1245.
7. J.P. Gambino and E.G. Colgan, Materials Chemistry and Physics 52, 99 (1998).
8. E.G. Colgan, J.P. Gambino and Q.Z. Hong, Mater. Sci. Eng. Rep. R16, 43 (1996).
9. S.L. Hsia, T.Y. Tan, P. Smith and G.E. MCGuire, J. Appl. Phys. 72, 1864 (1992).
10. M. Lawrence A. Dass, David B. Fraser and Chih-Shih Wei, Appl. Phys. Lett. 58, 1308 (1991).
11. C. Detavernier, R.L. Van Meirhaeghe and F. Cardon, Appl. Phys. Lett. 74, 2930 (1999).
12. Jeong Soo Byun, Jae Jeong Kim and Woo Shik Kim, J. Electrochem. Soc. 142, 2805 (1995).
13. R.T. Tung, Appl. Phys. Lett. 68, 3461 (1996).
14. Gi Bum Kim, Joon Seop Kwak and Hong Koo Baik, J. Appl. Phys. 85, 1503 (1999).
15. Dongwook Kim and Hyeongtag Jeon, Thin Solid Films 346, 244 (1999).
16. S.L. Hsia and T.Y. Tan, J. Appl. Phys. 70, 7579 (1991).
17. S.Q. Wang, L.S. Hung and J.W. Mayer, Thin Solid Films 162, 199 (1988).
18. Sanghyun Yoon and Hyeongtag Jeon, J. Korean Phys. Soc. 34, 365 (1999).
19. G. Ottaviani, K.N. Tu, J.W. Mayer and B.Y. Tsaur, Appl. Phys. Lett. 36, 331 (1980).
20. J.W. Mayer, S.S. Lau and K.N. Tu, J. Appl. Phys. 53, 1577 (1979).
21. T.P. Noaln, R. Sinclair and R. Beyers, J. Appl. Phys. 71, 720 (1992).