Chemical signal enhancement by chemical amplification

Comments on Inorganic Chemistry

Volumn 23, Issue 4, 2002, Pages 275-287

  Ehret, Anne ^a   Spitler, Mark T ^a   Stuhl, Louis S ^a  

^a ChemMotif Inc   (United States)

Author keywords

Amplification; Catalysis; Cobalt chemistry; Imaging; Sensors

Indexed keywords

AMPLIFIER; ARTICLE; CATALYSIS; CATALYST; MEDICAL LITERATURE; PHOTOGRAPHY;

EID: 0035993481     PISSN: 02603594     EISSN: None     Source Type: Journal    
DOI: 10.1080/02603590213136     Document Type: Article

References (26)

1. Steinfeld, J. I. and Wormhoudt, J. 1998. Explosives detection: A challenge for physical chemistry. Ann. Rev. Phys. Chem. 49: 203.
2. Lepkowski, W. 1999. Arsenic crisis spurs scientists. Chem. & Eng. News., 17 May, 45. U.S. Environmental Protection Agency, Office of Water, Ground Water and Drinking Water, Arsenic (March 31, 2000).
3. Hamilton, J. F. 1977. The mechanism of formation of the latent image, The Theory of the Photographic Process. 4th Ed. Ed. T. H. James, 109, New York: Macmillan.
4. West, W. 1977. The silver halide grain and the formation of the developable image. Neblette's Handbook of Photography and Reprography. 7th Ed. Ed. J. M. Sturge, 43 New York: Van Nostrand Reinhold.
5. Thirtle, J. R. 1977. Principles and chemistry of color photography. The Theory of the Photographic Process. 4th Ed. Ed. T. H. James, 335 New York: Macmillan.
6. MacDonald, S. A., Willson, C. G. and Frechet, J. M. J. 1994. Chemical amplification in high resolution imaging systems. Acct. Chem. Res. 27: 151. Reichmanis, E. et al. 1991. Chemical amplification mechanisms for microlithography. Chem. Mater. 3: 394.
7. MacDonald, S. A., Willson, C. G. and Frechet, J. M. J. 1994. Chemical amplification in high resolution imaging systems. Acct. Chem. Res. 27: 151. Reichmanis, E. et al. 1991. Chemical amplification mechanisms for microlithography. Chem. Mater. 3: 394.
8. Lamola, A. A., Szmanda, C. R., and Thackeray, J. W. 1991. Chemically amplified resists. Solid State Technol. 34(8): 53. Fahey, J. et al. 1995. New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group. Proc. SPIE 2438:125-142.
9. Lamola, A. A., Szmanda, C. R., and Thackeray, J. W. 1991. Chemically amplified resists. Solid State Technol. 34(8): 53. Fahey, J. et al. 1995. New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group. Proc. SPIE 2438:125-142.
10. U.S. Patent Office. 1999. Imaging Medium and Process for Producing an Image, by R.A. Gaudiana et al., assigned to Polaroid Corporation, Patent 6,004,719, Washington, D.C.; 1996. Imaging Medium, by R. A. Gaudiana et al., assigned to Polaroid Corporation, Patent 5,631,118, Washington, D.C.; J. M. Grasshoff et al., 1996. Process for Generation of Acid and for Imaging, and Imaging Medium for Use Therein, by assigned to Polaroid Corporation, Patent 5,534,388, Washington, D.C., and references therein.
11. U.S. Patent Office. 1999. Imaging Medium and Process for Producing an Image, by R.A. Gaudiana et al., assigned to Polaroid Corporation, Patent 6,004,719, Washington, D.C.; 1996. Imaging Medium, by R. A. Gaudiana et al., assigned to Polaroid Corporation, Patent 5,631,118, Washington, D.C.; J. M. Grasshoff et al., 1996. Process for Generation of Acid and for Imaging, and Imaging Medium for Use Therein, by assigned to Polaroid Corporation, Patent 5,534,388, Washington, D.C., and references therein.
12. U.S. Patent Office. 1999. Imaging Medium and Process for Producing an Image, by R.A. Gaudiana et al., assigned to Polaroid Corporation, Patent 6,004,719, Washington, D.C.; 1996. Imaging Medium, by R. A. Gaudiana et al., assigned to Polaroid Corporation, Patent 5,631,118, Washington, D.C.; J. M. Grasshoff et al., 1996. Process for Generation of Acid and for Imaging, and Imaging Medium for Use Therein, by assigned to Polaroid Corporation, Patent 5,534,388, Washington, D.C., and references therein.
13. Key patents in this series include: U.S. Patent Office. 1978. High Gain Cobalt(III) Complex Composition and Element, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,075,019, Washington, D.C.; 1978. Redox Amplification Process Employing a Combination of Oxidizing Agents, by V. L. Bissonette, assigned to Eastman Kodak Company, Patent 4,097,278, Washington, D.C.; 1982. Transition Metal Photoreduction Systems and Processes, by A. Adin and J. C. Fleming, assigned to Eastman Kodak Company, Patent 4,334,005, Washington, D.C.; 1990. Photoresist Compositions Containing Cobalt (III) Compound and Redox Tranfer Ligand, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,968,586, Washington, D.C. 1982. Photo-Sensitive and Heat-Sensitive Composition and Recording Element Using Same, M. Kunikane et al., assigned to Ricoh Co., Ltd., Patent 4,315,068, Washington, D.C.
14. Key patents in this series include: U.S. Patent Office. 1978. High Gain Cobalt(III) Complex Composition and Element, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,075,019, Washington, D.C.; 1978. Redox Amplification Process Employing a Combination of Oxidizing Agents, by V. L. Bissonette, assigned to Eastman Kodak Company, Patent 4,097,278, Washington, D.C.; 1982. Transition Metal Photoreduction Systems and Processes, by A. Adin and J. C. Fleming, assigned to Eastman Kodak Company, Patent 4,334,005, Washington, D.C.; 1990. Photoresist Compositions Containing Cobalt (III) Compound and Redox Tranfer Ligand, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,968,586, Washington, D.C. 1982. Photo-Sensitive and Heat-Sensitive Composition and Recording Element Using Same, M. Kunikane et al., assigned to Ricoh Co., Ltd., Patent 4,315,068, Washington, D.C.
15. Key patents in this series include: U.S. Patent Office. 1978. High Gain Cobalt(III) Complex Composition and Element, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,075,019, Washington, D.C.; 1978. Redox Amplification Process Employing a Combination of Oxidizing Agents, by V. L. Bissonette, assigned to Eastman Kodak Company, Patent 4,097,278, Washington, D.C.; 1982. Transition Metal Photoreduction Systems and Processes, by A. Adin and J. C. Fleming, assigned to Eastman Kodak Company, Patent 4,334,005, Washington, D.C.; 1990. Photoresist Compositions Containing Cobalt (III) Compound and Redox Tranfer Ligand, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,968,586, Washington, D.C. 1982. Photo-Sensitive and Heat-Sensitive Composition and Recording Element Using Same, M. Kunikane et al., assigned to Ricoh Co., Ltd., Patent 4,315,068, Washington, D.C.
16. Key patents in this series include: U.S. Patent Office. 1978. High Gain Cobalt(III) Complex Composition and Element, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,075,019, Washington, D.C.; 1978. Redox Amplification Process Employing a Combination of Oxidizing Agents, by V. L. Bissonette, assigned to Eastman Kodak Company, Patent 4,097,278, Washington, D.C.; 1982. Transition Metal Photoreduction Systems and Processes, by A. Adin and J. C. Fleming, assigned to Eastman Kodak Company, Patent 4,334,005, Washington, D.C.; 1990. Photoresist Compositions Containing Cobalt (III) Compound and Redox Tranfer Ligand, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,968,586, Washington, D.C. 1982. Photo-Sensitive and Heat-Sensitive Composition and Recording Element Using Same, M. Kunikane et al., assigned to Ricoh Co., Ltd., Patent 4,315,068, Washington, D.C.
17. Key patents in this series include: U.S. Patent Office. 1978. High Gain Cobalt(III) Complex Composition and Element, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,075,019, Washington, D.C.; 1978. Redox Amplification Process Employing a Combination of Oxidizing Agents, by V. L. Bissonette, assigned to Eastman Kodak Company, Patent 4,097,278, Washington, D.C.; 1982. Transition Metal Photoreduction Systems and Processes, by A. Adin and J. C. Fleming, assigned to Eastman Kodak Company, Patent 4,334,005, Washington, D.C.; 1990. Photoresist Compositions Containing Cobalt (III) Compound and Redox Tranfer Ligand, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,968,586, Washington, D.C. 1982. Photo-Sensitive and Heat-Sensitive Composition and Recording Element Using Same, M. Kunikane et al., assigned to Ricoh Co., Ltd., Patent 4,315,068, Washington, D.C.
18. U.S. Patent Office. 1978. High Gain Cobalt(III) Complex Composition and Element, by T. DoMinh, assigned to Eastman Kodak Company, Patent 4,075,019, Washington, D.C.
19. U.S. Patent Office. 1980. Radiation Sensitive Co(III) Complex Photoreduction Element with Image Recording Layer, by A. Adin and J. C. Fleming, assigned to Eastman Kodak Company, Patent 4,201,588, Washington, D.C.; 1981. Imaging Processes, Elements and Compositions Featuring Dye-Retaining Binders for Reaction Products of Cobalt Complexes and Aromatic Dialdehyde, by G. L. Fletcher et al., assigned to Eastman Kodak Company, Patent 4,247,625, Washington, D.C., and references therein.
20. U.S. Patent Office. 1980. Radiation Sensitive Co(III) Complex Photoreduction Element with Image Recording Layer, by A. Adin and J. C. Fleming, assigned to Eastman Kodak Company, Patent 4,201,588, Washington, D.C.; 1981. Imaging Processes, Elements and Compositions Featuring Dye-Retaining Binders for Reaction Products of Cobalt Complexes and Aromatic Dialdehyde, by G. L. Fletcher et al., assigned to Eastman Kodak Company, Patent 4,247,625, Washington, D.C., and references therein.
21. U.S. Patent Office. 1992. Signal Amplifying Cobalt (III) Redox Reagents and Methods for the Determination of Analytes in Aqueous Fluids, by E. R. Schmittou, assigned to Eastman Kodak Company, Patent 5,141,855, Washington, D.C.; 1992. Cobalt(III) Reagents in Combination with Water Soluble Polymers, by B. A. Burdick and R. W. Zercie, assigned to Eastman Kodak Company, Patent 5,171,669, Washington, D.C.
22. U.S. Patent Office. 1992. Signal Amplifying Cobalt (III) Redox Reagents and Methods for the Determination of Analytes in Aqueous Fluids, by E. R. Schmittou, assigned to Eastman Kodak Company, Patent 5,141,855, Washington, D.C.; 1992. Cobalt(III) Reagents in Combination with Water Soluble Polymers, by B. A. Burdick and R. W. Zercie, assigned to Eastman Kodak Company, Patent 5,171,669, Washington, D.C.
23. Mochizuki, K. and Fujimoto, M. 1985. Bivalent cobalt complexes with 1-(2-pyridylazo)-2-naphthol and analogous ligands. Bull. Chem. Soc. Jpn. 58: 1520.
24. Seminal patents in this area include: U.S. Patent Office. 1970. Multilayer Paper Test Strips, by H. P. Anderson, Patent 3,511,608, Washington, D.C. [multilayer paper test strips]; 1975. Device for Testing Solutions and Body Fluids, by C. L. Lightfoot, assigned to Sun Scientific, Patent 3,901,657, Washington, D.C. [multi-layer coatings for test strips]; 1977. Integral Element for Analysis of Liquids, by P. L. Clement, assigned to Eastman Kodak Company, Patent 4,042,335, Washington, D.C. [multi-layer test strips with a concentrating top layer and other functional layers].
25. Seminal patents in this area include: U.S. Patent Office. 1970. Multilayer Paper Test Strips, by H. P. Anderson, Patent 3,511,608, Washington, D.C. [multilayer paper test strips]; 1975. Device for Testing Solutions and Body Fluids, by C. L. Lightfoot, assigned to Sun Scientific, Patent 3,901,657, Washington, D.C. [multi-layer coatings for test strips]; 1977. Integral Element for Analysis of Liquids, by P. L. Clement, assigned to Eastman Kodak Company, Patent 4,042,335, Washington, D.C. [multi-layer test strips with a concentrating top layer and other functional layers].
26. Seminal patents in this area include: U.S. Patent Office. 1970. Multilayer Paper Test Strips, by H. P. Anderson, Patent 3,511,608, Washington, D.C. [multilayer paper test strips]; 1975. Device for Testing Solutions and Body Fluids, by C. L. Lightfoot, assigned to Sun Scientific, Patent 3,901,657, Washington, D.C. [multi-layer coatings for test strips]; 1977. Integral Element for Analysis of Liquids, by P. L. Clement, assigned to Eastman Kodak Company, Patent 4,042,335, Washington, D.C. [multi-layer test strips with a concentrating top layer and other functional layers].