Wetting and absorbency of nonionic surfactant solutions on cotton fabrics

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 187-188, Issue , 2001, Pages 385-397

  Kim, Chunhee ^a   Hsieh, You Lo ^b  

^a Hannam University   (South Korea)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Cotton (unscoured, scoured); Liquid retention; Molecular area; Nonionic surfactants; Sorbitan monolaurate (Span 20) and polyoxyethylene(20) sorbitan monolaurate (Tween 20); Wetting

Indexed keywords

ABSORPTION; COTTON FABRICS; CRITICAL MICELLE CONCENTRATION; HYDROPHOBICITY; SOLUTIONS; SURFACE TENSION; TEXTILE SCOURING; WETTING;

NONIONIC SURFACTANT SOLUTIONS;

SURFACE ACTIVE AGENTS;

POLYSORBATE 20; SORBITAN LAURATE; SURFACTANT; WETTING AGENT;

ADSORPTION; CLOTHING; CONFERENCE PAPER; COTTON; PRIORITY JOURNAL; SURFACE TENSION;

EID: 0035979950     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(01)00653-7     Document Type: Conference Paper

References (18)