Microstructure and rheological behaviour of electrosterically stabilized silica particle suspensions

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 190, Issue 1-2, 2001, Pages 89-98

  So, Jae Hyun ^b   Yang, Seung Man ^b   Kim, Chongyoup ^a   Hyun, Jae Chun ^a  

^a Applied Rheology Center   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Charge stabilization; Microstructural transition; Rheological behaviour; Silica suspension; Soft and hard spheres

Indexed keywords

COATINGS; CRYSTAL MICROSTRUCTURE; IONIC STRENGTH; REFRACTIVE INDEX; RHEOLOGY; SHEAR FLOW; SILANES; VAN DER WAALS FORCES; VOLUME FRACTION;

STERIC STABILIZATION;

SILICA;

ETHYLENEDIAMINE DERIVATIVE; METHACRYLIC ACID 3 (TRIMETHOXYSILYL)PROPYL ESTER; METHACRYLIC ACID DERIVATIVE; N [3 (TRIMETHOXYSILYL)PROPYL]ETHYLENEDIAMINE; SILANE DERIVATIVE; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ADSORPTION; CONFERENCE PAPER; ELECTRICITY; HYDRODYNAMICS; IONIC STRENGTH; PARTICLE SIZE; PHASE TRANSITION; PRIORITY JOURNAL; SHEAR RATE; SUSPENSION; TECHNIQUE; VISCOSITY;

EID: 0035975757     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-7757(01)00668-9     Document Type: Conference Paper

References (30)

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