Requirements of power supply parameters for high-power pulsed magnetron sputtering

Thin Solid Films

Volumn 392, Issue 2, 2001, Pages 196-200

  Krause, U ^a   List, M ^a   Fuchs, H ^b  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

^b OTTO VON GUERICKE UNIVERSITY   (Germany)

Author keywords

Electrical properties and measurements; Optical coatings; Plasma processing and deposition; Sputtering; Tin oxide; Zinc oxide

Indexed keywords

OPTICAL COATINGS; PLASMAS; TIN COMPOUNDS; ZINC OXIDE;

PULSED MAGNETRON SPUTTERING (PMS);

MAGNETRON SPUTTERING;

EID: 0035974477     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01027-6     Document Type: Conference Paper

References (6)

1. Optical plasma emission - A useful tool to monitor and to control reactive magnetron sputtering