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Volumn 42, Issue 13, 2001, Pages 5633-5642

Path dependent microstructure orientation during strain compression of semicrystalline block copolymers

(3) Drzal, P L a Barnes, J D b Kofinas, P a

a UNIVERSITY OF MARYLAND (United States)

b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY (United States)

Author keywords

Block copolymers; Lamellar population; Plane strain compression

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLINE MATERIALS; CRYSTALLIZATION; MICROSTRUCTURE; MORPHOLOGY; X RAY SCATTERING;

MICROPHASE SEPARATION;

BLOCK COPOLYMERS;

CARBENE; ETHYLENE;

ARTICLE; MELTING POINT; MOLECULAR WEIGHT; RADIATION SCATTERING; SHEAR STRESS; TEMPERATURE SENSITIVITY;

EID: 0035970566 PISSN: 00323861 EISSN: None Source Type: Journal
DOI: 10.1016/S0032-3861(00)00864-8 Document Type: Article

Times cited : (26)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.