Controlling the branching ratio of the photodissociation of aligned Cl2 at 404 nm

Chemical Physics Letters

Volumn 340, Issue 1-2, 2001, Pages 83-88

  Sugita, Akihiro ^a   Suto, Kunihiro ^a,c   Kawasaki, Masahiro ^a   Matsumi, Yutaka ^b  

^a KYOTO UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c Showa Denko Materials Co   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035947539     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2614(01)00388-8     Document Type: Article

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