A study of carrier motion on a dual-face CMP machine

Journal of Materials Processing Technology

Volumn 116, Issue 2-3, 2001, Pages 194-200

  Tso, Pei Lum ^a   Wang, Yu Yuan ^b   Tsai, Ming Jiang ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b Trace Storage Technology Corp   (Taiwan)

Author keywords

Chemical mechanical polishing; Hypocycloid; Planarization; Scratch pattern; Surface roughness

Indexed keywords

GEARS; GRINDING (MACHINING); SUBSTRATES; SURFACE ROUGHNESS;

CARRIER MOTION;

CHEMICAL MECHANICAL POLISHING;

EID: 0035944493     PISSN: 09240136     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-0136(01)01045-7     Document Type: Article

References (3)