SCOPUS 정보 검색 플랫폼

Volumn 435, Issue 2, 2001, Pages 357-366

Determination of silicon in nickel-based alloys using electrothermal atomic absorption spectrometry with longitudinal Zeeman-effect background correction and zinc oxide pretreatment

(3) Chen, Shi Yang a Wu, Ming Shu a Tsai, Suh Jen Jane a

a PROVIDENCE UNIVERSITY (Taiwan)

Author keywords

Chemical modifier; Electrothermal atomic absorption spectrometry; Matrix separation; Nickel based alloys; Silicon

Indexed keywords

ALLOY; AMMONIA; EDETIC ACID; GRAPHITE; IRON; LEAD NITRATE; MAGNESIUM DERIVATIVE; NICKEL; SILICON; TARTARIC ACID; ZINC OXIDE;

ACCURACY; ANALYTIC METHOD; ARTICLE; ATOMIC ABSORPTION SPECTROMETRY; CHEMICAL ANALYSIS; CHEMOSENSITIVITY; EXTRACTION; MEASUREMENT; PRECIPITATION; PRIORITY JOURNAL; REDUCTION; VALIDATION PROCESS;

EID: 0035942541 PISSN: 00032670 EISSN: None Source Type: Journal
DOI: 10.1016/S0003-2670(01)00855-8 Document Type: Article

Times cited : (6)

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