Direct patterning of photosensitive low-dielectric-constant films using electron-beam lithography

Applied Physics Letters

Volumn 78, Issue 17, 2001, Pages 2557-2559

  Kikkawa, Takamaro ^a   Nagahara, Tatsuro ^b   Matsuo, Hideki ^b  

^a HIROSHIMA UNIVERSITY   (Japan)

^b Clariant Japan Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035938367     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1360777     Document Type: Article

References (5)

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