SCOPUS 정보 검색 플랫폼

Materials Science and Engineering: B

Volumn 80, Issue 1-3, 2001, Pages 60-64

Development of a novel tool for semiconductor process control

(6) Gwilliam, R M a Knights, A P a Wendler, E a Sealy, B J a Burrows, C P b Coleman, P G b

a UNIVERSITY OF SURREY (United Kingdom)

b University of Bath (United Kingdom)

Author keywords

Epilayers; Positron annihilation; SiN

Indexed keywords

ANNEALING; DENSIFICATION; ELLIPSOMETRY; EPITAXIAL GROWTH; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POSITRON ANNIHILATION SPECTROSCOPY; PROCESS CONTROL; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTOR GROWTH; SILICON NITRIDE;

POSITRON BEAMS;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0035932276 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5107(00)00589-4 Document Type: Article

Times cited : (6)

References (9)

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- For example see Ziegler, Ion Implantation Science & Technology (Academic Press 1984)

2
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- Keenan, W.A.¹ Johnson, W.H.² Yarling, C.B.³

3
- 0005143507
- and (1991) 29
- (1991) Sol. State Technol. , vol.34 , pp. 57
- Yarling, C.B.¹ Johnson, W.H.² Keenan, W.A.³ Larson, L.A.⁴

4
- 0001347746
- (1999) J. Appl. Phys. , vol.86 , pp. 5988-5992
- Coleman, P.G.¹ Knights, A.P.² Gwilliam, R.M.³

5
- 0000552788
- (1999) Appl. Phys. Lett. , vol.75 , pp. 466-468
- Knights, A.P.¹ Malik, F.² Coleman, P.G.³

6
- 0004124717
- World Scientific, Singapore
- (2000) Positron Beams and their Applications
- Coleman, P.G.¹

7
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- (1994) J. Appl. Phys. , vol.76 , pp. 4935
- Asoka-Kumar, P.¹ Lynn, K.G.² Welch, D.O.³

8
- 85166079773
- submitted for publication
- (2000)
- Knights, A.P.¹ Gwilliam, R.M.² Sealy, B.J.³ Grasby, T.J.⁴ Parry, C.P.⁵ Fulgoni, D.J.F.⁶ Phillips, P.J.⁷ Whall, T.E.⁸ Parker, E.H.C.⁹ Coleman, P.G.¹⁰

9
- 85166098728
- (1992) Sensors and Actuators A , vol.3 , pp. 153

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.