Gas-sensitivity of SnO2 layers treated by rapid thermal annealing process

Materials Science and Engineering: B

Volumn 83, Issue 1-3, 2001, Pages 223-226

  Andreev, S K ^a   Popova, L I ^a   Gueorguiev, V K ^a   Ivanov, Tz E ^a   Beshkov, G ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Gas sensitivity; Rapid thermal annealing process; SnO2 layers

Indexed keywords

AMMONIA; ATMOSPHERIC HUMIDITY; MOSFET DEVICES; RAPID THERMAL ANNEALING; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; THERMAL CYCLING; TIN COMPOUNDS; VACUUM APPLICATIONS; VAPORS;

TIN OXIDE;

CHEMICAL SENSORS;

EID: 0035927962     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00533-5     Document Type: Article

References (8)