Self-similarity and pattern selection in the roughening of binary liquid films

Physical Review Letters

Volumn 86, Issue 21, 2001, Pages 4863-4866

  Hoppe, Harald ^a   Heuberger, Marcus ^a   Klein, Jacob ^a  

^a WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ENCAPSULATION; INTERFACES (MATERIALS); STRUCTURE (COMPOSITION); THIN FILMS; WETTING;

BINARY LIQUID FILM; PATTERN SELECTION; ROUGHENING; SELF SIMILARITY;

BINARY MIXTURES;

EID: 0035926726     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.86.4863     Document Type: Article

References (22)