Behaviour of sodium deposited onto thin silica layers

Surface Science

Volumn 482-485, Issue PART 1, 2001, Pages 376-380

  Lagarde, P ^a   Flank, A M ^a   Mazzara, C ^b   Jupille, J ^b  

^a UNIVERSITÉ PARIS SACLAY   (France)

^b CNRS   (France)

Author keywords

Alkali metals; Amorphous thin films; Silicon oxides; X ray absorption spectroscopy

Indexed keywords

ABSORPTION SPECTROSCOPY; AMORPHOUS FILMS; DEPOSITION; DIFFUSION IN SOLIDS; DISSOLUTION; EVAPORATION; METALLIC FILMS; OXYGEN; SODIUM; THERMAL EFFECTS; THIN FILMS; VACUUM APPLICATIONS; X RAY SPECTROSCOPY;

X RAY ABSORPTION SPECTROSCOPY;

SILICA;

EID: 0035918996     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(00)01032-3     Document Type: Conference Paper

References (8)