Microstructure of pure tin electrodeposited films

Scripta Materialia

Volumn 44, Issue 8-9, 2001, Pages 2285-2289

  Teshigawara, Tomoya ^a   Nakata, Takeshi ^a   Inoue, Koichiro ^a   Watanabe, Tohru ^b  

^a SHIBAURA INSTITUTE OF TECHNOLOGY   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

Electrodeposition; Microstructure; SEM; Tin; XRD

Indexed keywords

AMORPHOUS ALLOYS; CRYSTAL ORIENTATION; ELECTROPLATING; GRAIN SIZE AND SHAPE; METAL FOIL; METALLOGRAPHIC MICROSTRUCTURE; MORPHOLOGY; NICKEL ALLOYS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TIN; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS FOILS;

METALLIC FILMS;

EID: 0035906772     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(01)00759-X     Document Type: Article

References (3)