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Volumn 44, Issue 8-9, 2001, Pages 2347-2351

Surface characterization of aqueous washed silicon nitride powders by TPDMS and isoelectric point measurement

(4) Ishizaki, Ch a Nakamatsu, T a Kusumi, T a Ishizaki, K a

a NAGAOKA UNIVERSITY OF TECHNOLOGY (Japan)

Author keywords

Isoelectric point; Oxygen distribution; Powder; Silicon nitride; Surface; Temperature programmed desorption mass spectrometry (TPDMS)

Indexed keywords

CERAMIC MATERIALS; DECOMPOSITION; EXTRACTION; MASS SPECTROMETRY; OXYGEN; PH EFFECTS; POWDERS; PRECIPITATION (CHEMICAL); REDUCTION; SURFACE TREATMENT; TEMPERATURE PROGRAMMED DESORPTION; WASHING;

ISOELECTRIC POINT MEASUREMENT; TEMPERATURE PROGRAMMED DESORPTION MASS SPECTROMETRY (TPDMS);

SILICON NITRIDE;

EID: 0035906564 PISSN: 13596462 EISSN: None Source Type: Journal
DOI: 10.1016/S1359-6462(01)00772-2 Document Type: Article

Times cited : (3)

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