Cathode sputtering as a pre-treatment for gas nitriding

Vacuum

Volumn 63, Issue 4, 2001, Pages 517-522

  Baranowska, J ^a   Szczecinski K ^a   Wysiecki, M ^a  

^a WEST POMERANIAN UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Cathode sputtering; Gaseous nitriding; Nitriding kinetics; Surface activation

Indexed keywords

CURRENT DENSITY; ELECTRIC POTENTIAL; NITRIDING; OPTICAL MICROSCOPY; REACTION KINETICS; SURFACE REACTIONS; SURFACE ROUGHNESS; X RAY DIFFRACTION ANALYSIS;

GASEOUS NITRIDING; SURFACE ACTIVATION;

SPUTTERING;

EID: 0035899447     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(01)00232-9     Document Type: Conference Paper

References (15)