Fabrication of strain-balanced Si/Si1-xGex multiple quantum wells on Si1-yGey virtual substrates and their optical properties

Applied Physics Letters

Volumn 79, Issue 3, 2001, Pages 344-346

  Kawaguchi, K ^a   Shiraki, Y ^a   Usami, N ^b   Zhang, J ^c   Woods, N J ^c   Breton, G ^c   Parry, G ^c  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

^c IMPERIAL COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

FABRICATION; MOLECULAR BEAM EPITAXY; OPTICAL PROPERTIES; PHONONS; PHOTOLUMINESCENCE; SEMICONDUCTING SILICON COMPOUNDS; STRAIN; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

VIRTUAL SUBSTRATES;

SEMICONDUCTOR QUANTUM WELLS;

EID: 0035898463     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1387263     Document Type: Article

References (13)