Indium-tin-oxide thin films prepared by dip coating; dependence of resistivity on film thickness and annealing atmosphere

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 11 B, 2001, Pages

  Seki, Shigeyuki ^a   Ogawa, Makoto ^a   Sawada, Yutaka ^a  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

Author keywords

2 aminoethanol; Indium acetate; ITO films; Monoethanolamine; Tin chloride; Transparent conducting films

Indexed keywords

ANNEALING; CARRIER CONCENTRATION; CARRIER MOBILITY; COATING TECHNIQUES; COMPOSITION; CRYSTALLINE MATERIALS; ELECTRIC CONDUCTIVITY MEASUREMENT; ELECTRIC CONDUCTIVITY OF SOLIDS; SEMICONDUCTING INDIUM COMPOUNDS; THICKNESS MEASUREMENT; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS;

AMINOETHANOL; DIP COATING; ENERGY DISPERSIVE X-RAY FLUORESCENCE ANALYSIS; FILM THICKNESS; INDIUM ACETATE; INDIUM TIN OXIDE THIN FILM; MONOETHANOLAMINE; TIN CHLORIDE; TRANSPARENT CONDUCTING FILM; VAN DER PAUW METHOD;

THIN FILMS;

EID: 0035891956     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l1244     Document Type: Letter

References (15)