Chemical vapor deposition of Si on chlorosilane-treated SiO2 surfaces. II. Selective deposition in the regions defined by electron-beam irradiation

Journal of Applied Physics

Volumn 90, Issue 8, 2001, Pages 3887-3893

  Yasuda, T ^a   Nishizawa, M ^a   Yamasaki, S ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035886266     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1402978     Document Type: Article

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