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Journal of Materials Science Letters

Volumn 20, Issue 16, 2001, Pages 1485-1487

Hardness of hafnium carbide films deposited on silicon by pulsed laser ablation

(4) Barinov, S M a Ferro, D b Bertuli, C c D'Alessio, L d

a RUSSIAN ACADEMY OF SCIENCES (Russian Federation)

b CNR (Italy)

c SAPIENZA UNIVERSITY OF ROME (Italy)

d UNIVERSITY OF BASILICATA (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

FERMI SURFACE; FILM GROWTH; HAFNIUM COMPOUNDS; HARDNESS; MICROSTRUCTURE; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; THERMODYNAMIC STABILITY; TITANIUM CARBIDE;

PULSED LASER ABLATION DEPOSITION (PLAD);

THIN FILMS;

EID: 0035880353 PISSN: 02618028 EISSN: None Source Type: Journal
DOI: 10.1023/A:1017970212233 Document Type: Article

Times cited : (12)

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