|
|
Volumn 386, Issue 2, 2001, Pages 271-275
|
|
Characterization of (Ti,Al)N films deposited by pulsed d.c. plasma-enhanced chemical vapor deposition
|
|
Author keywords
(Ti,Al)N; Characterization; PECVD
|
|
Indexed keywords
ALUMINUM ALLOYS;
COMPOSITION EFFECTS;
CORROSION RESISTANCE;
EMISSION SPECTROSCOPY;
FILM PREPARATION;
FRICTION;
GLOW DISCHARGES;
INTERFACES (MATERIALS);
OXIDATION RESISTANCE;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SOLDERING;
SUBSTRATES;
TITANIUM COMPOUNDS;
WEAR RESISTANCE;
X RAY DIFFRACTION ANALYSIS;
LOW FRICTION COEFFICIENTS;
SUPERIOR SOLDERING;
PROTECTIVE COATINGS;
|
|
EID: 0035874131
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01672-2 Document Type: Article |
|
Times cited : (18)
|
|
References (17)
|
