Formation of relief gratings in photoreactive polymers via gas phase modification

Synthetic Metals

Volumn 121, Issue 1-3, 2001, Pages 1751-1752

  Kavc, T ^a   Langer, G ^a   Kern, W ^a   Kranzelbinder, G ^b   Toussaere, E ^b   Voss S ^a  

^a GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^b UNIVERSITÉ PARIS SACLAY   (France)

Author keywords

Amorphous thin films; Atomic force microscopy; Ellipsometry; Lasers; Organic inorganic interfaces

Indexed keywords

GAS PHASE MODIFICATION;

AGENTS; AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CHEMICAL MODIFICATION; DISTRIBUTED FEEDBACK LASERS; ELLIPSOMETRY; GRAFT COPOLYMERS; OPTICALLY PUMPED LASERS; PHOTOREACTIVITY; PLASTIC FILMS; REFRACTIVE INDEX; THIN FILMS; ULTRAVIOLET RADIATION; VINYL RESINS;

CONDUCTIVE PLASTICS;

EID: 0035867821     PISSN: 03796779     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0379-6779(00)00642-1     Document Type: Article

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