Photooxidation of benzene to phenol by ruthenium bipyridine complexes grafted on mesoporous silica FSM-16

Journal of Molecular Catalysis A: Chemical

Volumn 166, Issue 2, 2001, Pages 211-218

  Fujishima, Keiko ^a   Fukuoka, Atsushi ^a   Yamagishi, Akihiko ^a   Inagaki, Shinji ^b   Fukushima, Yoshiaki ^b   Ichikawa, Masaru ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

^b Rd Management Section   (Japan)

Author keywords

Benzene; FSM 16; Phenol; Photooxidation; Ru complex

Indexed keywords

BENZENE; BIPYRIDINE; CHLORIDE; FERROUS GLUCONATE; HYDROGEN PEROXIDE; HYDROXYCYCLOHEXADIENYL RADICAL; HYDROXYL GROUP; OXIDIZING AGENT; PHENOL; RADICAL; RUTHENIUM BIPYRIDINE COMPLEX; RUTHENIUM DERIVATIVE; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ARTICLE; CATALYSIS; CHEMICAL REACTION; CHEMICAL STRUCTURE; COMPLEX FORMATION; EXCITATION; HYDROXYLATION; PHOTOACTIVATION; PHOTOCHEMISTRY; PHOTOOXIDATION; PHYSICAL CHEMISTRY; RADIATION ABSORPTION; STRUCTURE ACTIVITY RELATION; ULTRAVIOLET RADIATION;

EID: 0035865551     PISSN: 13811169     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1381-1169(00)00412-X     Document Type: Article

References (28)