Surface nitridation processes and non-linear behaviour of the reactive magnetron discharge with titanium target

Vacuum

Volumn 61, Issue 2-4, 2001, Pages 163-167

  Luca, D ^a   Van Denier Der Gon, A W ^b   Anita, V ^a   Ponjee, M W G ^b   Brongersma, H H ^b   Popa, G ^a  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

AES; LEIS; Nitridation enhancement; Reactive magnetron discharge; V I characteristics; XPS

Indexed keywords

ARGON; AUGER ELECTRON SPECTROSCOPY; CATHODES; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC IMPEDANCE; ION BEAMS; MAGNETRON SPUTTERING; NITRIDING; NITROGEN; PRESSURE EFFECTS; X RAY PHOTOELECTRON SPECTROSCOPY;

LOW ENERGY ION SCATTERING (LEIS) SPECTROSCOPY; NITRIDATION ENHANCEMENT PROCESS; REACTIVE MAGNETRON DISCHARGE (RMD);

TITANIUM;

EID: 0035858580     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(00)00474-7     Document Type: Conference Paper

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