Structure and generation mechanism of the peroxy-radical defect in amorphous silica

Physical Review Letters

Volumn 86, Issue 20, 2001, Pages 4560-4563

  Uchino, T ^a   Takahashi, M ^a   Yoko, T ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMS; CHEMICAL BONDS; CRYSTAL STRUCTURE; DEFECTS; DIFFUSION; FREE RADICAL REACTIONS; MATHEMATICAL MODELS; QUANTUM THEORY;

DIFFUSION-LIMITED ANNEAL MECHANISMS; PEROXY RADICALS (POR); QUANTUM CHEMICAL CALCULATIONS;

SILICA;

EID: 0035858548     PISSN: 00319007     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevLett.86.4560     Document Type: Article

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