Comment on "Effect of current crowding on vacancy diffusion and void formation in electromigration" [Appl. Phys. Lett. 76, 988 (2000)]

Applied Physics Letters

Volumn 79, Issue 7, 2001, Pages 1061-

  Lloyd, J R ^a  

^a IBM T J WATSON RESEARCH CENTER   (United States)

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[No Author keywords available]

Indexed keywords

EID: 0035855093     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1386624     Document Type: Note

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