The production of H2O2 in the microwave discharge plasma of CH4/O2

Journal of Physical Chemistry A

Volumn 105, Issue 44, 2001, Pages 10089-10092

  Fujii, Toshihiro ^a   Iijima, Shinichi ^a   Iwase, Keiichiro ^a   Arulmozhiraja, Sundaram ^a  

^a NATIONAL INSTITUTE FOR ENVIRONMENTAL STUDIES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MICROWAVE DISCHARGE PLASMAS;

HYDROGEN PEROXIDE; LITHIUM; MASS SPECTROMETRY; MICROWAVES; OXYGEN; PLASMAS; POSITIVE IONS;

METHANE;

EID: 0035829306     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp012113q     Document Type: Article

References (24)

1. Venugopalan, M.; Jones, R. A. Chem. Rev. 1966, 66, 133.
2. Mearns, A. M.; Ajayi-Obe, O. Symp. Electrochem. Eng. 1973, 2, 86.
3. Roychowdhury, S.; Roychowdhury, U. K.; Venugopalan, M. Plasma Chem. Plasma Process. 1982, 2, 157.
4. Fujii, T.; Syouji, K. J. Phys. Chem. 1993, 97, 11380.
5. Fujii, T.; Syouji, K. Phys. Rev. E 1994, 49, 657.
6. Bufalini, J. J.: Gay, B. W., Jr.: Brubaker, K. L. Environ. Sci. Technol. 1972, 6, 816.
7. Thiel, W. Angew. Chem., Int. Ed. Engl. 1999, 38, 3157.
8. Fabian, J.; Bryce, W. A. 7th Int. Symp. Combust. 1958, 150.
9. Fujii, T.; Ogura, M.; Jimba, H. Anal. Chem. 1989, 61, 1026.
10. Fujii, T. Chem. Phys. Lett. 1992, 191, 162.
11. Fujii, T. Anal. Chem. 1992, 64, 775.
12. Search from the file of the NIST-ONLINE, http://webbook.nist.gov/ cgi.
13. Fujii, T.; Shouji, K. Phys. Rev. E 1994, 49, 657.
14. Vincent, M. A.; Hillier, I. H. J. Phys. Chem. 1995, 99, 3109.
15. Smith, S. F.; Chandrasekhar, J.; Jorgensen, W. L. J. Phys. Chem. 1982, 86, 3308-3318.
16. Del Bene, J. E.; Frisch, M. J.; Raghavachart, K.; Pople, J. A.; Schleyer, P. v. R. J. Phys. Chem. 1983, 87, 73.
17. Taft, R. W.; Anvia, F.; Gal, J. F.; Walsh, S.; Capon, M.; Holmes, M. C.; Hosn, K.; Oloumi, G.; Yasawala, R.; Yazdani, S. Pure Appl. Chem. 1990, 62, 17.
18. Stockigt, D. Chem. Phys. Lett. 1996, 250, 387.
19. Remko, M. Mol. Phys. 1997, 91, 929.
20. Miklis, P. C.; Ditchfield, R.; Spencer, T. A. J. Am. Chem. Soc. 1998, 120, 10482.
21. Arulmozhiraja, S.; Fujii, T.; Tokiwa, H. Chem. Phys. 1999, 250, 237.
22. Arulmozhiraja, S.; Fujii, T. J. Phys. Chem. A 2000, 104, 9613.
23. Frisch, M. J.; Trucks, G. W.; Schlegel, H. B.; Scuseria, G. E.; Robb, M. A.; Cheeseman, J. R.; Zakrzewski, V. G.; Montgomery, J. A.; Stratmann, R. E.; Burant, J. C.; Dapprich, S.; Millam, J. M.; Daniels, A. D.; Kudin, K. N.; Strain, M. C.; Farkas, O.; Tomasi, J.; Barone, V.; Cossi, M.; Cammi, R.; Mennucci, B.; Pomelli, C.; Adamo, C.; Clifford, S.; Ochterski, J.; Petersson, G. A.; Ayala, P. Y.; Cui, Q.; Morokuma, K.; Malick, D. K.; Rabuck, A. D.; Raghavachari, K.; Foresman, J. B.; Cioslowski, J.; Ortiz, J. V.; Stefanov, B. B.; Liu, G.; Liashenko, A.; Piskorz, P.; Komaromi, I.; Gomperts, R.; Martin, R. L.; Fox, D. J.; Keith, T.; Al-Laham, M. A.; Peng, C. Y.; Nanayakkara, A.; Gonzalez, C.; Challacombe, M.; Gill, P. M. W.; Johnson, B. G.; Chen, W.; Wong, M. W.; Andres, J. L.; Head-Gordon, M.; Replogle, E. S.; Pople, J. A. Gaussian 98, revision A.7; Gaussian, Inc.: Pittsburgh, PA, 1998.
24. Staley, R. H.; Beauchamp, J. L. J. Am. Chem. Soc. 1975, 97, 5920.