Silicon Chemical Vapor Deposition (CVD) on microporous powders in a fluidized bed

Powder Technology

Volumn 120, Issue 1-2, 2001, Pages 82-87

  Kouadri Mostefa, S ^a   Serp, P ^b   Hemati M ^a   Caussat, B ^a  

^a LABORATOIRE DE GÉNIE CHIMIQUE   (France)

^b UNIVERSITÉ DE TOULOUSE   (France)

Author keywords

CVD; Fluidized bed; Microporous powders; Silicon

Indexed keywords

FLUIDIZED BEDS; MICROPOROUS MATERIALS; SILICON; SURFACE PROPERTIES;

CHEMICAL VAPOR DEPOSITION (CVD);

POWDERS;

NANOPARTICLE; SILANE; SILICON;

FLUIDIZED BED; POROSITY; POWDER; SILICON;

ANALYTIC METHOD; COMPARATIVE STUDY; CONFERENCE PAPER; FLUIDIZED BED; MODEL; PARAMETER; POROSITY; POWDER; SURFACE PROPERTY; VAPOR;

EID: 0035829175     PISSN: 00325910     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-5910(01)00351-5     Document Type: Conference Paper

References (10)

1. Extension du procédé de dépôt de silicium par CVD en lit fluidisé à des conditions opératoires peu conventionnelles: Dépôts sur poudres poreuses et/ou sous pression réduite
2. Coating of small particles by Chemical Vapor Deposition while the particles are fluidized
3. Feasibility of fluidized bed CVD for the formation of protective coatings
4. Synthesis of AlN/SiC composite powders by floating type fluidized bed CVD
5. Silicon deposition from silane and disilane in a fluidized bed: Parts I and II
6. Production of polycrystalline silicon from monosilane in a fludized bed - Effects of the diluent gas on the conversion and on the properties of the product
7. MOCVD of rhodium, palladium and platinum complexes on fluidized divided substrates: Novel process for one-step preparation of noble metal catalysts
8. Etude hydrodynamique des lits fluidisés sous vide et sous haute température
9. Fluidization at vacuum conditions. A generalized equation for the prediction of minimum fluidization velocity