A calculation model for the evaporation recoil pressure in laser material processing

Journal of Physics D: Applied Physics

Volumn 34, Issue 17, 2001, Pages 2637-2642

  Chen, X ^a   Wang, H X ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATTENUATION; COMPUTER SIMULATION; ENERGY UTILIZATION; EVAPORATION; LASER APPLICATIONS; LASER PRODUCED PLASMAS; LIGHT REFLECTION; MONTE CARLO METHODS; VAPOR PRESSURE;

LASER MATERIAL PROCESSING;

LASER BEAM EFFECTS;

EID: 0035822957     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/34/17/310     Document Type: Article

References (11)