Insulating ultrathin silica films formed by a room-temperature sol-gel process

Advanced Materials

Volumn 13, Issue 9, 2001, Pages 662-667

  Robertson, J W ^a   Cai, M ^a   Pemberton, J E ^a  

^a University of Arizona   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DENSIFICATION; DIELECTRIC PROPERTIES; LEAKAGE CURRENTS; MICROSTRUCTURE; OXIDATION; PRESSURE; SILANES; SILICA; TEMPERATURE;

ALKOXIDES; CHLOROSILANES; HIGH TEMPERATURE ANNEALING; SOL-GEL PROCESSES;

ULTRATHIN FILMS;

EID: 0035799607     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(200105)13:9<662::aid-adma662>3.0.co;2-%23     Document Type: Article

References (46)