SCOPUS 정보 검색 플랫폼

Volumn 391, Issue 1, 2001, Pages 62-68

Ir deposition by surface combustion of (MeCp)Ir(COD): An experimental simulation of metallorganic chemical vapor deposition

(3) Yan, X M a Kim, C a White, J M a

a UNIVERSITY OF TEXAS AT AUSTIN (United States)

Author keywords

(MeCp)Ir(COD); Chemical vapor deposition; Iridium; TOFMS TPD

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; COMBUSTION; COMPUTER SIMULATION; DECOMPOSITION; DESORPTION; FILM GROWTH; INTERFACES (MATERIALS); IRIDIUM; MASS SPECTROMETRY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONOLAYERS;

ISOTHERMAL REACTION SPECTROSCOPY; TIME-OF-FLIGHT MASS SPECTROMETRY;

PROTECTIVE COATINGS;

EID: 0035797063 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)00908-7 Document Type: Article

Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.