In diffusion in B2-type ordered NiAI intermetallic compound

Defect and Diffusion Forum

Volumn , Issue 194-199 PART 1, 2001, Pages 517-522

  Minamino, Y ^a   Koizumi, Y ^a   Inui, Y ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Activation Energy; Anti Site Atom; Atomic Jumps; Compounds; Diffusion; Indium, NiAl; Vacancies

Indexed keywords

ACTIVATION ENERGY; DIFFUSION; INTERMETALLICS; STOICHIOMETRY;

STRUCTURAL DEFECTS;

NICKEL COMPOUNDS;

EID: 0035780691     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.194-199.517     Document Type: Article

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