Diffusion of Si and Ge in the intermetallic phase Fe3Si: Ion implantation and SIMS studies

Defect and Diffusion Forum

Volumn , Issue 194-199 PART 1, 2001, Pages 499-504

  Wellen, M ^a   Fielitz, P ^a   Borchardt, G ^a   Weber, S ^b   Scherrer, S ^b   Mehrer, H ^c   Baumann, H ^d   Sepiol, B ^e  

^a CLAUSTHAL UNIVERSITY OF TECHNOLOGY   (Germany)

^b INSTITUT JEAN LAMOUR   (France)

^c UNIVERSITY OF MÜNSTER   (Germany)

^d GOETHE UNIVERSITY   (Germany)

^e UNIVERSITY OF VIENNA   (Austria)

Author keywords

D03 Structure; Implantation; Intermetallic Alloy; Ordered Alloy; Self Diffusion; SIMS

Indexed keywords

GERMANIUM; INTERMETALLICS; ION IMPLANTATION; IRON COMPOUNDS; RADIOISOTOPES; SECONDARY ION MASS SPECTROMETRY; SILICON;

INTERMETALLIC PHASE;

DIFFUSION;

EID: 0035780546     PISSN: 10120386     EISSN: 16629507     Source Type: Journal    
DOI: 10.4028/www.scientific.net/ddf.194-199.499     Document Type: Article

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