Anodic alumina as a material for MEMS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4592, Issue , 2001, Pages 355-361

  Delendik, Kirill I ^a   Voitik, Olga L ^a  

^a B I STEPANOV INSTITUTE OF PHYSICS   (Belarus)

Author keywords

Anodic aluminium oxide; Anodization; Barrier and porous layer; Local oxidation; Porous structure; Precision etching

Indexed keywords

ANODIC OXIDATION; DIELECTRIC MATERIALS; ETCHING; MICROELECTROMECHANICAL DEVICES; POROUS MATERIALS;

ANODIC ALUMINA;

ALUMINA;

EID: 0035772502     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448987     Document Type: Conference Paper

References (5)

1. T.W. Whitney, J.S. Jiang, P.C. Searson, and C.L. Chien, Science 261, pp. 1316-1322, 1993.
2. R.J. Tonucci, B.L. Justus, A.J. Campillo, and C.E. Ford, Science 258, pp. 783-792, 1992.
3. J.P. O'Sullivan, and G.C. Wood Proc. Roy. Soc. Lond. A 317, pp. 511-558, 1970.
4. K. Shimizu, K. Kobayashi, G.E. Thompson, and G.C. Wood, Philos. Mag. A 66, pp. 643-656, 1992.
5. S. Ono, H. Ichinose, and N. Masuko, Corros. Sci. 33, pp. 841-853, 1992.