Preparation and performance of Si microchannel plate

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4601, Issue , 2001, Pages 284-287

  Duanmu, Qingduo ^a   Tian, Jingqua ^a   Li, Ye ^a   Dan, Tangren ^a   Lu, Yaohua ^a   Jiang, Delong ^a   Fu, Lichen ^a  

^a CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

Aspect ratio; Dynode; Microchannel plate; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC RESISTANCE; FABRICATION; INDUCTIVELY COUPLED PLASMA; PLASMA ETCHING;

MICROCHANNEL PLATES;

SILICON;

EID: 0035772444     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.444697     Document Type: Article

References (3)

1. J.R. Horton, G.W. Tasker, and J.J. Fijol, "Characteristics and applications of advanced technology microchannel plate", SPIE. 1306, pp. 169-178, 1990.
2. S.M. Shank, R.J. Soave, et al., "Fabrication of high aspect ratio structures for microchannel plates", J. Vac. Sci. Technol. B13(6), pp. 2736-2740, 1995.
3. Tian Jingquan, Zhang Baifu, et al., "UV-photo-method for measurement of MCP characteristic parameters", SPIE, 1230, pp. 228-230, 1990.