High-density, low-loss MOS capacitors for integrated RF decoupling

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4587, Issue , 2001, Pages 477-483

  Roozeboom, F ^a   Elfrink, R J G ^a   Rijks, Th G S M ^a   Verhoeven, J F C M ^a   Kemmeren, A ^a   Van den Meerakker, J E A M ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

ESL; ESR; High Density MOS Capacitor; Integrated Passives; Integrated RF Supply Line Decoupling; Low Loss; Macroporous Silicon Etching

Indexed keywords

CAPACITANCE; CERAMIC CAPACITORS; DRY ETCHING; MICROSTRIP LINES; PASSIVE NETWORKS; POROUS SILICON; POWER AMPLIFIERS; SILICON WAFERS; SUBSTRATES; SURFACE MOUNT TECHNOLOGY;

SUPPLY-CHAIN DECOUPLING;

MOS CAPACITORS;

EID: 0035768613     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

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