Whole wafer critical point drying of MEMS devices

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4558, Issue , 2001, Pages 189-196

  Resnick, P J ^a   Clews, P J ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

CO2; Drying; MEMS; Stiction; Supercritical

Indexed keywords

CARBON DIOXIDE; DRYING; IMPURITIES; METHANOL; STICTION;

CONTINUOUS STIRRED-TANK REACTORS (CSTR) MODELS;

MICROELECTROMECHANICAL DEVICES;

EID: 0035765666     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.443011     Document Type: Conference Paper

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