Dry etching characteristics of attenuated phase-shifting masks using Cl2/CF4/O2/He plasmas

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 561-570

  Choi, Se Jong ^a   Cha, Han Sun ^a   Yoon, Si Yeul ^a   Jung, Sung Mo ^a   Choi, Sang Soo ^a   Jeong, Soo Hong ^a  

^a PKL Photronics   (South Korea)

Author keywords

Anisotropy; Att. PSM; Cl2; ICP; MoSiON

Indexed keywords

ANISOTROPY; CHLORINE; DRY ETCHING; ELECTROMAGNETIC WAVE ATTENUATION; INDUCTIVELY COUPLED PLASMA; LITHOGRAPHY; MOLYBDENUM COMPOUNDS; PHASE SHIFT; SURFACE ROUGHNESS;

SUB-MICRON LITHOGRAPHY;

MASKS;

EID: 0035763976     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458335     Document Type: Article

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