PMJ01 panel discussion review, 'issues on mask technology for 100-nm lithography'

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 313-320

  Tanabe, Hiroyoshi ^a   Sano, Hisatake ^a  

^a Elpida Memory Inc   (Japan)

Author keywords

CD control; Defect control; Mask cost; OPC mask; PSM; Technology roadmap

Indexed keywords

COSTS; DEFECTS; KRYPTON; PHASE SHIFT; PHOTORESISTS;

PHOTOMASKS;

MASKS;

EID: 0035763969     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458306     Document Type: Conference Paper

References (0)