Chrome etch for <0.13 μm advanced reticle production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 633-640

  Buie, Melisa J ^a   Stoehr, Brigitte ^a   Huang, Yi Chiau ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

Chrome etch; Photomask etch; Plasma etch

Indexed keywords

CHLORINE; OPTIMIZATION; OXYGEN; PHOTORESISTS; PLASMA ETCHING;

CRITICAL DIMENSION CONTROL;

MASKS;

EID: 0035763804     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.458345     Document Type: Conference Paper

References (9)

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9. Etec, MEBES and Alta are registered trademarks of Etec Systems, Inc., an Applied Materials company. Centura is a registered trademark of Applied Materals, Inc.