Lithographic simulation: A review

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4440, Issue , 2001, Pages 59-72

  Mack, Chris A ^a  

^a KLA Tencor Austin   (United States)

Author keywords

Electromagnetic Field Simulation; Electron Beam Lithography; Lithography Simulation; Optical Lithography; ProBEAM 3D; ProCD; PROLITH; ProMAX 2D

Indexed keywords

COMPUTER SIMULATION; ELECTROMAGNETISM; ELECTRON BEAM LITHOGRAPHY; SEMICONDUCTOR MATERIALS; STATISTICAL METHODS;

MASK TOPORAPHY; SEMICONDUCTOR INDUSTRY;

PHOTOLITHOGRAPHY;

EID: 0035760045     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.448059     Document Type: Conference Paper

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