Development of a CMOS compatible process for silicon miniature microphone with a high sensitivity

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4414, Issue , 2001, Pages 276-279

  Chen, Jing ^a   Liu, Litian ^a   Li, Zhijian ^a   Tan, Zhimin ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

CMOS compatible; Corrugated diaphragm; Integrate; Micromachine; Miniature microphone

Indexed keywords

DIAPHRAGMS; ELECTRIC IMPEDANCE; MICROPHONES; MICROPROCESSOR CHIPS; MOS DEVICES; MOSFET DEVICES; POLYSILICON; RESISTORS;

MICRO-ACOUSTIC SYSTEMS;

CMOS INTEGRATED CIRCUITS;

EID: 0035759462     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.440209     Document Type: Conference Paper

References (4)

1. P.R. Scheeper, A.G.H. van der Donk, W. Olthuis, P. Bergveld, "A review of silicon microphones", Sensors and Actuators A 44, pp. 1-11, 1994.
2. Chen Jing, Liu Litian, Li Zhijian, et al," Design and Fabrication of a silicon miniature condenser microphone ", Chinese Journal of Acoustics 20, pp. 130-138, 2001.
3. Chen Jing, Liu Litian, Li Zhijian, "Design, simulation and optimization of a highly sensitive micromachined membrane ", Solid State Electronics Research and Progress, Accepted.
4. Chen Jing, Liu Litian, Li Zhijian, et al, "Study of Anisotropic Etching of (100) Si with Ultrasonic Agitation", submitted to ICSITC-2001.