Lens aberration control for fine patterning with PSM

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 1, 2001, Pages 713-722

  Kudo, Takehito ^a   Hirukawa, Shigeru ^a   Nakashima, Toshiharu ^a   Matsumoto, Koichi ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

CD control; Lens aberration; PSM; Zernike polynomials

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; IMAGING TECHNIQUES; LENSES; MASKS; PHASE SHIFT; POLYNOMIALS;

PHASE SHIFT MASKS (PSM);

PHOTOLITHOGRAPHY;

EID: 0035758351     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435769     Document Type: Conference Paper

References (3)

1. D.G.Glagello et.al., "Towards a comprehensive control of full field image quality in optical photolithography" Proc. SPIE 3051 p.672 (1997).
2. C,J.Progler and D.Wheeler, "Optical lens specification from user's perspective" Pre. SPIE 3334, p.256 (1998).
3. N.R.Farrer et.al., "In-situ measurement of lens aberrations", Proc. SPIE 4000, p. 18 (2000).